Cost-effective equipment for surface pre-treatment for cleaning and excitation of substrates in semiconductor technology

Abstract This article presents a cost-effective ultraviolet-ozone cleaner (UV/O 3 Cleaner) for surface pre-treatment of substrates in the field semiconductor technology. The consists two chambers, upper one contains electronics, including time counter. lower chamber UV sterilisation lamps and reflector anodized aluminium, which confines area high Ozone concentration interest. device is successfully used cleaning modification different materials. To this end, important wavelengths 253.7 nm (excitation organic residues) 184.9 (production ozone from atmospheric environment as strong oxidant) were first detected. effectiveness UV/O demonstrated by improving properties indium tin oxide (ITO) OLED fabrication. contact angle water to ITO could be reduced 90° 3° diiodomethane, it was 55° 31° within 10 min irradiation. greatly improved wettability polar non-polar liquids can increase flexibility further process control. In addition, an improvement characterized measuring angles titanium dioxide (TiO 2 ) polydimethylsiloxane (PDMS). TiO decreased 70° 10°, that diiodomethane 54° 31°. PDMS also increased. Here, 109° 24° 89° 49°. Article Highlights We report dry-cleaning based on Contact measurements show materials due modification. UVO3 improves layer formation optoelectrical OLEDs.